EBE - AX

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Specifications

The Electron Beam Evaporator - AX (EBE-AX) is designed for use in MBE systems to generate thin films on substrates through vapor deposition. This deposition technique is typically operated in a vacuum range from 1x10-11 to 1x10-5 mbar and allows an efficient material utilization relative to other methods, which yields a high deposition rate from 0,1µm/min to 100µm/min at low substrate temperatures. The film thickness can be controlled by a rate monitor and a shutter. The sublimation is realized through direct electron bombardment of the deposition material without heating up the whole crucible. The electrons are extracted from a tungsten filament through VDC-annealing and accelerated towards the deposition material by means of high voltage in combination with a magnetic deflection of the electron beam. The process is a form of physical vapor deposition (PVD). Furthermore a water cooling system tempers the crucible holder.

Options:
  • Unit for vacuum isolation

 

TYPE EBE-AX
TEMPERATURE RANGE up to 2700 °C
HEATING SYSTEM direct e-beam bombardment
(electrons extracted from W-filament and accelerated to the crucible by magnetic deflection)
BAKE-OUT TEMPERATURE 200 °C
FLANGE SIZE DN 63 | 100 (others on request)
MAX. OUTER DIAMETER 60 mm (others on request)
MIN. UHV LENGTH 240 mm
EVAPORATION FROM 4 cc | 5 cc crucible
COOLING integrated water cooling
MAX. BEAM POWER 4 kV (0,5 A at 8 kV)
PRIMARY BEAM DEFLECTION 100 mA

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