Atomic Hydrogen Source (HLC)

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Specifications

Atomic hydrogen is very reactive and allows the cleaning of various substrates (like GaAs, InP, etc.) at low temperatures. In addition, it can be also used for surfactant growth of epitaxial layers. Molecular hydrogen gas flows through a tube passing a hot filament which is located at the end of this tube and which is heated up to 2800°C. By this an excellent cracking efficiency of molecular into atomic hydrogen is achieved. Using a high precision valve the hydrogen gas pressure can be directly adjusted. A very accurate pressure control is possible with a mass flow controller, which is mounted between the hydrogen gas bottle and the leak valve.

Options:
  • HLC-T
  • Molybdenum version
  • Tungsten version
  • Mass flow controller

 

TYPE HLC HLC-T
TEMPERATURE RANGE

200 - 2300 °C

200 - 2800 °C
HEATING SYSTEM filament radiation heating resistive cylinder heating
MAX. POWER 280 W 350 W
BAKE-OUT TEMPERATURE 250 °C
FLANGE SIZE DN 40 | 63 (others on request)
MAX. OUTER DIAMETER 38 mm (others on request)
MIN. UHV LENGTH 180 mm

 

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