CVD-System

The combination of PVD and CVD methods in material science becomes more and more important in order to prepare new materials (material engineering). In the following a typical system is presented and described for each functional part.

Load-Lock Chamber:

• Diameter 8 inch
• Sample storage up to 6 samples
• 2 inch substrate size
• Sample degassing station
• Turbo molecular pump (TMP)

Reactor and Growth Chamber:

• Diameter 10 inch
• 8 Ports for effusion cells, e-beam evaporators, plasma source
• 4 Ports for gas injectors and crackers
• Heatable sample manipulator up to 1300°C with sample rotation
• Ports for RHEED, beam flux monitor, pyrometer and RGA
• Ion pump with integrated titanium sublimation pump, TMP with magnetic bearings and cryopump
• Base pressure: 1×10-11 mbar

Analysis Chamber:

• Diameter 8 inch
• Sample manipulator (x, y, z) with e-beam heater and cooling stage
• LEED and electron analyser
• Ion source, UV source, x-ray source
• AFM/STM with He cooling
• Mass spectrometer
• Ion pump or TMP