RS-3 System
Complete MBE System for the preparation of epitaxial films (semiconductors, metals, dielectrics and organics) on 2" to 4" wafers for various scientific applications.
- UHV-compatible (achievable base pressure better than 5 x 10-11 mbar in the growth chamber)
- High precision and high quality standard (made in Germany)
- Easy-to-handle
- State-of-the-art technology (substrate temperature and film thickness uniformities better than +/- 1%)
- Ready for use after installation on site
Technical Data:
Type | RS-3 |
Concept | Load-lock, preparation and growth chamber |
Made from | Stainless steel (316 L / 316 LN) |
Sample size | 2 - 4 inch or as specified |
Effusion cell port number | 10 |
Manipulator | Radiation heating up to 800 °C |
Cooling | Two shrouds in the area of the substrate and in the area of the effusion cells |
Bakeout temperature | 200°C |
Shipping | Wooden box |
Installation | Included |
Standards:
Growth chamber size | 18 inch or as specified |
Number of effusion cells | 2 x SFC, 1 x LTC, 1 x DFC, 1 x HTC with integrated manual shutter or as specified |
Pumping | Ion pump (growth and preparation chamber) and TMP (load-lock chamber) or as specified |
Sample transfer | Manual with magnetically coupled trolley |
Sample preparation | Heating station in the preparation chamber |
Bake out system | Included |
Frame | Solid frame made of stainless steel |
Electronics | Stored in an external 19 inch rack |
Options:
- Expandable design for the attachment of further equipment
- Motorisation of transfer and automisation (EMERALT)
- Further effusion cells, plasma sources or e-beam evaporators
- Integration of RHEED (SAFIRE), Ellipsometry or RDS
- Hydrogen source in the preparation chamber
- Coolable manipulator
Available Downloads:
For further information, please contact
sales(at)createc.de.