RS-2 System
Complete MBE System for the preparation of epitaxial films (semiconductors, metals, dielectrics and organics) on 1" or 2" wafers for various scientific applications.
- UHV-compatible (achievable base pressure better than 5 x 10-11 mbar in the growth chamber)
- High precision and high quality standard (made in Germany)
- Easy-to-handle
- State-of-the-art technology (substrate temperature and film thickness uniformities better than +/- 1%)
- Ready for use after installation on site
Technical Data:
Type | RS-2 |
Concept | Load-lock and growth chamber |
Made from | Stainless steel (316 L / 316 LN) |
Sample size | 1 - 2 inch or as specified |
Effusion cell port number | 6 |
Manipulator | Radiation heating up to 800 °C |
Cooling | Additional shroud in the area of the substrate |
Bakeout temperature | 200°C |
Shipping | Wooden box |
Installation | Included |
Standards:
Growth chamber size | 16 inch or as specified |
Number of effusion cells | 2 x SFC, 1 x LTC, 1 x DFC with integrated manual shutter and water cooling or as specified |
Pumping | Ion pump (growth chamber) and TMP (load-lock chamber) or as specified |
Sample transfer | Manual |
Bake out system | Included |
Frame | Solid frame made of stainless steel |
Electronics | Stored in an external 19 inch rack |
Options:
- Expandable design for the attachment of further equipment
- Motorisation of transfer and automisation (EMERALT)
- Further effusion cells, plasma sources or e-beam evaporators
- Integration of RHEED (SAFIRE), Ellipsometry or RDS
Available Downloads:
For further information, please contact
sales(at)createc.de.