Beam Flux Monitor
CreaTec's beam flux monitor BAF is used for the precise measurement of the beam equivalent pressure (BEP) in an MBE system. A Bayard Alpert type flux gauge on a movable positioning system allows the measurement in substrate position. High precision electronics guarantees an extremely stable detection of the investigated molecular beam intensity. With an optionally available computer system the control of the beam flux measurement is very convenient.
Technical Data:
Type | BAF |
Measurement system | Bayard Alpert ion gauge |
Linear motion | 200mm to 600mm stroke, manually operated |
Bakeout Temperature | 250°C |
Electronics | High precision electronics to measure the BEP current in μA with computer interface |
Standards:
Flange size | CF 40 / CF 63 or as specified |
Max outer diameter | 34mm/ 50mm or as specified |
Length | As specified |
Stroke | As specified |
Options:
- Integral shutter
- Quartz crystal monitor instead of Bayard-Alpert ionisation gauge
- Valve with by-pass
- Motorized version
For further information, please contact
sales(at)createc.de.


